High-temperature sputtering targets play a key role in many high-tech fields, especially in application scenarios that require high-temperature stability. The following is an introduction to the top ten most common high-temperature resistant sputtering targets:
1. Molybdenum and molybdenum alloy targets
Characteristics: Molybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm³. Molybdenum and its alloys have the advantages of high melting point, good electrical and thermal conductivity, low coefficient of thermal expansion, excellent corrosion resistance, and environmental friendliness.
Application: Molybdenum and molybdenum alloy targets have been widely used in electronic and electrical appliances, solar cells, and glass coating.
2. Ruthenium targets
Characteristics: Ruthenium targets have good heat resistance, corrosion resistance, and mechanical strength, and are suitable for use in high temperature, high pressure, and corrosive environments.
Preparation process: The ruthenium powder is loaded into a graphite mold, vibrated and pressed, and then placed into a vacuum hot press furnace for unidirectional hot press sintering. The sintering process is carried out in a protective gas atmosphere at a temperature of 1600-1800°C and a sintering pressure of 5-20 MPa.
Application: Ruthenium targets can be used for thin film deposition of electronic devices, as well as the preparation of optical films and optical coatings.
3. Ultra-high purity aluminum sputtering targets
Characteristics: Aluminum targets have high purity and excellent conductivity, and are suitable for the preparation of conductive and barrier layers for semiconductor devices.
Market status: The global ultra-high purity aluminum sputtering target market is expected to reach $380 million in 2029, with a compound annual growth rate (CAGR) of 5.6%.
4. Copper indium gallium selenide (CIGS) targets
Characteristics: CIGS targets are mainly used in the production of thin film solar cells.
Application: With the rapid development of the solar industry, the demand for CIGS targets is also increasing.
5. Indium Tin Oxide (ITO) Targets
Characteristics: ITO targets are mainly used in the manufacture of transparent conductive film, widely used in touch screens and flat panel displays.
Market position: With the growing demand for consumer electronics products, the market position of ITO targets is becoming increasingly important.
6. Tungsten target
Characteristics: Tungsten has a high melting point (3422°C) and excellent wear resistance, which is suitable for sputtering targets deposition of high-temperature and wear-resistant materials.
Applications: Tungsten targets are widely used in semiconductors, electronic devices, and wear-resistant coatings.
7. Titanium target
Characteristics: Titanium target has good corrosion resistance and biocompatibility, suitable for sputtering deposition of medical devices and biosensors.
Application: With the continuous development of medical technology, titanium target has a broad application prospect in the field of medical devices.
8. Tantalum target
Characteristics: Tantalum target has a high melting point (2996°C) and excellent chemical stability, which is suitable for sputtering deposition of high temperature and chemically stable materials.
Application: Tantalum targets are widely used in electronic devices, aerospace, and chemical fields.
9. Niobium targets
Characteristics: Niobium targets have a high melting point (2468°C) and excellent superconductivity, suitable for sputtering deposition of superconducting materials and electronic devices.
Application: Niobium targets are widely used in superconducting materials, electronics, and aerospace.
10. Zirconium target
Characteristics: Zirconium targets have good corrosion resistance and biocompatibility, as well as a high melting point (1852°C), suitable for sputtering targets deposition of corrosion-resistant and biocompatible materials.
Application: Zirconium targets are widely used in medical devices, chemical equipment, and electronic devices.
In summary, the above top ten high-temperature resistant sputtering targets have their characteristics and are widely used in many fields such as semiconductors, optics, photovoltaics, electronic devices, medical devices, and so on. With the progress of science and technology and changes in market demand, the research and development of these targets is moving towards higher performance, lower cost, and more environmentally friendly direction.
